PVD is the abbreviation for Physical Vapor Deposition in English, which means “物理气相沉积" in Chinese. It refers to a technology that the workpiece is coated with a thin film layer using the physical methods under the conditions of vacuum. 

The coating equipment fabricated by Hesheng company is combined the DC Magnetron sputtering with the linear ion beam technology.. 

The technology principle are explained in the following. That a mass of Ar ion strike the cathode target material generates the sputtering on the target material surface, which means the atom or molecules escape from the target surface and move to the workpiece to form a thin film further.   The principle of linear ion beam technology is that hydrocarbon group from the hydrocarbon gas glow discharge is accelerated toward and deposited on the workpiece surface on the vacuum.  

The PVD coating technology not only can obtain the useful coating layer but also is no pollution and friendly to the environment. 

The thickness of PVD coating is the micrometer scale, usually ranging from 1μm to 3μm . Therefore, it can improve the various physical and chemical properties of the workpiece surface without affecting the original size, and there is no need for further treatment after coating.